300mm UV-Ozone Cleaner
The UV-Ozone Cleaning System, Model UV-312 has a 308mm x 308mm sample stage and removes organic contaminants from semiconductor wafer surfaces. It can also be used for surface activation and modification. This system utilizes a dry cleaning process and is best used in final cleaning steps for the removal of trace organics.
Change of Contact Angle: Exposure Time: 5min, Distance: 10mm, Sample: Si Wafer