UV Ozone Cleaning Systems provide a simple, inexpensive and fast method of obtaining ultra-clean surfaces free of organic contaminants on most substrates, such as quartz, silicon, gold, nickel, aluminum, gallium arsenide, alumina, glass slides, etc. Ultra-clean surfaces can easily be achieved by utilizing a UV Ozone Cleaner in just a few minutes after the substrate has been cleaned.
The UV Ozone Cleaning process is a photo-sensitized oxidation process in which the contaminant molecules of photo resists, resins, human skin oils, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by the absorption of short wavelength UV radiation. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 185nm and ozone by 254nm ultra-violet wavelengths. The 254nm UV radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler, volatile molecules which desorbs from the surface. Therefore, when both UV wavelengths are present atomic oxygen is continuously generated, and ozone is continually formed and destroyed. Using a UV Ozone Cleaning system near atomically clean surfaces can be achieved in minutes without any damage to your devices.
Tabletop UV Ozone Cleaner, Model HELIOS-500UV Grid Lamp with Reflector
Drawer Safety Interlock
Very low cost of ownership
Available in 120VAC, 60Hz
Exhaust Port (1″ OD)
Atmospheric process at room temperature
Digital Process Timer (seconds, minutes, hours)
Digital Hour Counter (tracks UV lamp lifetime)
Very Compact and Lightweight design (12 lbs.)
Compact UV Ozone Cleaner, Model ProCleanerVery Compact and Lightweight design
Can process up to 5″x5″x1″ samples
Available in 110V or 220V AC
Very low cost of ownership
Dry, chemical-free process at room temperature
Compact UV-Ozone Cleaner, Model ProCleaner PLUSVery Compact and Lightweight design
Can process up to 5″x5″x1″ samples
Available in 110V or 220V AC
Very low cost of ownership
Dry, chemical-free process at room temperature
UV-Ozone Cleaning System, Model UV-208High-density ozone-producing UV grid lamp
Variable distance between the UV lamp and sample stage
Process up to 8″ x 8″ (200 mm) samples
Low-temperature wafer cleaning
Small, compact foot print
Drawer loading mechanism
Digital process timer, purge timer and UV lamp hour counter
UV-Ozone Cleaning System, Model UV-312High-density ozone-producing UV grid lamp
Variable distance between the UV lamp and sample stage
Process up to 12″ x 12″ (300 mm) samples
Low-temperature wafer cleaning
Small, compact foot print
Drawer loading mechanism
Digital process timer, purge timer and UV lamp hour counter
What is the advantage of UV-Ozone Cleaning over other surface treatment options?
While there are several options for surface cleaning and sample preparation methods, UV-ozone cleaning shows several advantages over other methods.
Low Charging Damage on Substrates
In case of plasma treatment, charging damage caused by ion bombardment can be a serious challenge. It leads to degradation of electrical characteristics of devices. UV-ozone treatment offers surface treatment using oxygen radicals without plasma discharge.
No Hazardous Effluent
Wet cleaning requires effluent disposal of chemicals. In contrast to the wet cleaning method, UV-ozone treatment is a completely dry process. Our UV-ozone cleaners are equipped with ozone killer, and exhaust ozone is decomposed inside the system. There is no need to worry about ozone hazard inside a cleanroom.