Tabletop UV Ozone Cleaner, Model HELIOS-500High-intensity UV grid lamp (185nm + 254nm)
5.5×5.5×1.5 inch (140x140mm) Drawer Sample Stage
UV Grid Lamp with Stainless Steel Reflector
Drawer Safety Interlocks
Low cost of ownership
2-Inch OD Exhaust Port
Atmospheric process at room temperature
Digital Process Timer (seconds, minutes, hours)
Digital Hour Counter (tracks UV lamp lifetime)
Very compact and lightweight design (12 lbs.)
300mm UV-Ozone Wafer Cleaner, Model HELIOS-1200High-intensity UV grid lamp (185nm + 254nm)
Process up to 12″ x 12″ samples or 300 mm wafers
Comes with different sample/wafer holders (4, 8 and 12 inches)
Ambient temperature at atmospheric pressure
Small and compact foot print
2-inch OD Exhaust Port
Drawer loading mechanism
Digital process timer
UV lamp hour counter
Compact UV Ozone Cleaner, Model ProCleanerVery Compact and Lightweight design
Can process up to 5″x5″x1″ samples
Available in 110V or 220V AC
Very low cost of ownership
Dry, chemical-free process at room temperature
Compact UV-Ozone Cleaner, Model ProCleaner PLUSVery Compact and Lightweight design
Can process up to 5″x5″x1″ samples
Available in 110V or 220V AC
Very low cost of ownership
Dry, chemical-free process at room temperature
UV-Ozone Cleaning System, Model UV-208High-density ozone-producing UV grid lamp
Variable distance between the UV lamp and sample stage
Process up to 8″ x 8″ (200 mm) samples
Low-temperature wafer cleaning
Small, compact foot print
Drawer loading mechanism
Digital process timer, purge timer and UV lamp hour counter
UV-Ozone Cleaning System, Model UV-312High-density ozone-producing UV grid lamp
Variable distance between the UV lamp and sample stage
Process up to 12″ x 12″ (300 mm) samples
Low-temperature wafer cleaning
Small, compact foot print
Drawer loading mechanism
Digital process timer, purge timer and UV lamp hour counter
Advantages of UV Surface Cleaning over other surface treatment options
While there are several options for surface cleaning and sample preparation methods, UV-ozone cleaning shows several advantages over other methods.
- Improved wettability resulting in better bonding and coating adhesion
- Does not damage materials
- Simple, fast and cost effective method of cleaning
- Does not induce electrostatic charge on samples
- Low Charging Damage on Substrates
In case of plasma treatment, charging damage caused by ion bombardment can be a serious challenge. It leads to degradation of electrical characteristics of devices. UV-ozone treatment offers surface treatment using oxygen radicals without plasma discharge.
- No Hazardous Effluent
Wet cleaning requires effluent disposal of chemicals. In contrast to the wet cleaning method, UV-ozone treatment is a completely dry and chemical-free process.
UVFAB Systems